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The Center for Micro/Nano Systems and Nanotechnology is led by Professor Shubhra Gangopadhyay in electrical and computer engineering. This center is a multidisciplinary research facility that houses Nano Mems Semiconductor Lab (NMS) with state of art equipment to support research in the field of micro/nano-fabrication and nanotechnology.

The mission of the Nano Mems Semiconductor Lab (NMS) is to serve and facilitate advanced research in processing and developing nanotechnology for academic and industrial users. NMS promotes the commercialization of nanomaterials research to meet the market needs in the commercial and defense sectors. Entrepreneurs, academic researchers, small and large companies can use our facility to turn their innovative ideas into novel product.

NMS lab has 10,000 sq. feet facility housed at the University of Missouri. Top down microfabrication is performed in a class 100 clean room facility. The lab features additional 1100 sq.ft of class 10,000 cleanroom space equipped with various semiconductor processing equipment including metal and dielectric deposition systems, glove box, rapid thermal annealing system, fumehoods for chemical processing and thermal oxidation systems.

Main activities of this center includes thin film process development for different applications, development of nano porous silicon films, functionalization of nanopours silicon films for biomedical application, development of SiCON films with high breakdown strength, diamond like carbon films based high through put cell ,microchip-based shock wave generator etc.

This center  is also working on synthesizing nanostructured materials such as quantum dots, nanoparticles, nanorods, and nanowires for life sciences, energy and defense applications.

 

Equipment at a glance

  • Thin Film deposition
    Physical Vapor deposition, PECVD, Thermal oxidation
  • Metallization
    RF/DC Sputering, E-Beam deposition, Thermal evaporator
  • Optical Lithography
    OAI Mask aligner (5um resolution), photoresist processing
  • Characterization
    Ellipsometry, DLS, AFM, Fluorimeter. FTIR, UV-Vis absorption, Raman, Contact angle system, SAXS, XRD
  • Packaging
    Dicing, Wire bonding, PCB integration

Prototype It Here

One of the Center’s core missions is to help industries to develop prototype devices and develop novel thin film processes for different applications.

Several thin film and nano material process development equipments are housed in this center along with characterization tools which will help in developing prototype devices at a faster pace.

  • Develop thin films/nanomaterials processes
  • Perform characterization and analysis to advance research by the use of state-of-the-art process development and characterization equipment.
  • We provide our services with expert advice and data interpretation to enhance competitiveness of industrial partners and to develop novel devices.

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Research Facility for Hire

The Center for Micro/Nano Systems & Nanotechnology is involved in research and development of nanoscale technologies that can be used for civil and defense applications. The center’s research is closely tied to the Gangopadhyay Research Group. It is also home of the Nano MEMS Semiconductor Utilization Core Facility which is available for use by academic and industrial researchers.

For Industry Researchers

Corporate and industrial users can utilize our research facility to develop new materials or thin film processes. Potential users should contact us for more details.

For Academic Researchers

Students and researchers from MU who are interested in using our facility will be trained and then allowed to use the equipment.