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Center for Nano/Micro Systems and Nanotechnology

The Center for Nano/Micro Systems and Nanotechnology was established in the College of Engineering at the University of Missouri in 2006 to serve the Midwest research community with opportunities for collaboration and to have access to advanced fabrication and characterization equipment. Its mission is to provide infrastructure and support to facilitate interdisciplinary research in MEMS, NEMS, nanotechnology, microfluidics, photonics, advanced materials, medicine and microbiology, and to create next generation leaders in their respective fields.

The Center provides a user facility located in Naka Hall at the University of Missouri and encompasses several individual laboratories including a class 100 clean room for photolithography, a biological laboratory, and two class 10,000 clean rooms for materials deposition and synthesis of nanoscale materials.

The Center enjoys collaborations with numerous faculty from colleges across campus and welcomes materials fabrication and characterization challenges for diverse applications.  Use of the Center’s processing and characterization equipment be utilized by students, faculty, and industrial partners is encouraged. For specific materials challenges, please contact us via email. Current users may schedule equipment time below.

Faculty

The Center boasts faculty members and affiliates from different departments. Details about their research groups and foci can be found by clicking the member’s name below.

Dr. Gary Baker
Dr. Sheila Baker
Dr. Peter Cornish
Dr. Shubhra Gangopadhyay
Dr. Keshab Gangopadhyay
Dr. Jie Gao
Dr. Sheila Grant
Dr. Suchi Guha
Dr. Heather Hunt
Dr. Raghuraman Kannan
Dr. Gavin King
Dr. Matt Maschmann
Dr. Thiruvengadathan Rajagopalan
Dr. Shramik Sengupta
Dr. Anandhi Upendran
Dr. Yangchuan Xing
Dr. Xiaodong Yang

User Facilities

The Center’s laboratories are housed in a 10,000 sq. ft. space that comprises a class 100 clean room for photolithography, two class 10,000 clean rooms for materials deposition and synthesis of nano materials. These labs include equipment for nanomaterials synthesis using both bottom-up and top-down approaches as well as MEMS/NEMS and, material characterization and testing tools. These laboratories are equipped with tools required for every stage of nanomaterials development, integration with MEMS/NEMS chips and devices, and materials testing and optimization. Some of the equipment available for internal MU users is shown below.

Internal MU users can use equipment in the Center under following conditions-
1) A valid MOCODE must be provided before using any equipment
2) Users must attend the chemical safety class offered by Environmental Health and Safety (EH&S).
3) Users must strictly abide by the laboratory rules.
4) Users must email details of experiments, such as materials and substrates, before you use any equipment to Dr. Shubhra Gangopadhyay and Joseph Mathai.

Downloads:

To book time slots online

  • Register in our database to start booking time slots.
  • Click “I am a New user” and follow the instructions on the screen.
  • Once you submit the form, it will ask you for an account number – type your “MOCODE”.
  • Facility manager will give access to instruments on which you have been trained; book time slots online as described above.

Lab Equipment

E-beam deposition system, Kurt J. Lesker AXXIS

Four pocket e-beam deposition system. Mainly used to deposit Metals and Oxides.
Four pocket e-beam deposition system. Mainly used to deposit Metals and Oxides.

DC/RF magnetron sputtering system, AJA Int

Three gun sputtering system to deposit Metals and Oxides.This system can also deposit high density, size controlled Metal Nano particles.
Three gun sputtering system to deposit Metals and Oxides.This system can also deposit high density, size controlled Metal Nano particles.

ALD system, Cambridge NanoTech

The XeF2 etcher uses XeF2 crystals and a vacuum chamber to produce fluorine vapors, which isotropically etch silicon. At room temperature, xenon difluoride, or XeF2, is in a solid crystalline form. When exposed to low pressures, the XeF2 crystals become a gas by sublimation. The XeF2 gas selectively etches silicon. It does not etch silica, most photoresist, oxides, nitrides and many metals.
The XeF2 etcher uses XeF2 crystals and a vacuum chamber to produce fluorine vapors, which isotropically etch silicon. At room temperature, xenon difluoride, or XeF2, is in a solid crystalline form. When exposed to low pressures, the XeF2 crystals become a gas by sublimation. The XeF2 gas selectively etches silicon. It does not etch silica, most photoresist, oxides, nitrides and many metals.

Thermal Evaporator, Kurt J. Lesker Co

Nano 38, Thermal evaporator is used to deposit Metals like, Cr, Ag, Au, Al and Organic films.
Nano 38, Thermal evaporator is used to deposit Metals like, Cr, Ag, Au, Al and Organic films.

Xenon difluoride etcher

The XeF2 etcher uses XeF2 crystals and a vacuum chamber to produce fluorine vapors, which isotropically etch silicon. At room temperature, xenon difluoride, or XeF2, is in a solid crystalline form. When exposed to low pressures, the XeF2 crystals become a gas by sublimation. The XeF2 gas selectively etches silicon. It does not etch silica, most photoresist, oxides, nitrides and many metals.
The XeF2 etcher uses XeF2 crystals and a vacuum chamber to produce fluorine vapors, which isotropically etch silicon. At room temperature, xenon difluoride, or XeF2, is in a solid crystalline form. When exposed to low pressures, the XeF2 crystals become a gas by sublimation. The XeF2 gas selectively etches silicon. It does not etch silica, most photoresist, oxides, nitrides and many metals.

Fluorescence Microscope

The BX51WI epi-illumination fluorescence microscope delivers high resolution imaging of fluorescent samples. The microscope is equipped with a several filter cubes for imaging common fluorophores including DAPI, FITC, Rhodamine 6G, TRITC, and Cy5. Samples can be viewed using 10x, 20x, 40x, 60x Water immersion, and 100x Oil immersion objectives and imaged using our ORCAFlash2.8 CCD camera or a USB4000 Ocean optics spectrometer. The microscope can illuminate the samples using either a high intensity Xenon arc lamp or halogen spotter lamp.
The BX51WI epi-illumination fluorescence microscope delivers high resolution imaging of fluorescent samples. The microscope is equipped with a several filter cubes for imaging common fluorophores including DAPI, FITC, Rhodamine 6G, TRITC, and Cy5. Samples can be viewed using 10x, 20x, 40x, 60x Water immersion, and 100x Oil immersion objectives and imaged using our ORCAFlash2.8 CCD camera or a USB4000 Ocean optics spectrometer. The microscope can illuminate the samples using either a high intensity Xenon arc lamp or halogen spotter lamp.

Plate Reader

The H4 plate reader delivers rapid processing capabilities for fluorescence or absorbance measurements. The reader is equipped with both a monochrometer (9, 13, 17, and 20 nm wavelength resolution settings) and filter cubes-360/40, 485/20, 530/25, 528/20, 590/35, 600/40 filters along with hole and plug settings. The plate reader can handle almost all well plate formats (6 to 364 well plates) and can obtain top or bottom fluorescence readings. Scans can be performed to obtain single point, area scans, and spectrum measurements.
The H4 plate reader delivers rapid processing capabilities for fluorescence or absorbance measurements. The reader is equipped with both a monochrometer (9, 13, 17, and 20 nm wavelength resolution settings) and filter cubes-360/40, 485/20, 530/25, 528/20, 590/35, 600/40 filters along with hole and plug settings. The plate reader can handle almost all well plate formats (6 to 364 well plates) and can obtain top or bottom fluorescence readings. Scans can be performed to obtain single point, area scans, and spectrum measurements.

Mbraun Glovebox

This glovebox maintains 0.1PPM level of humidity and Oxygen. A spincoater(SCS,G3P-8) and a hotplate(200C) is available to spin coat films inside the glovebox.
This glovebox maintains 0.1PPM level of humidity and Oxygen. A spincoater(SCS,G3P-8) and a hotplate(200C) is available to spin coat films inside the glovebox.

Thermal Oxidation Furnace

Thermal oxidation of silicon is usually performed at a temperature between 900 and 1200°C. It may use either water vapor or molecular oxygen as the oxidant to grow Oxide layer on silicon wafer.
Thermal oxidation of silicon is usually performed at a temperature between 900 and 1200°C. It may use either water vapor or molecular oxygen as the oxidant to grow Oxide layer on silicon wafer.

Class 100 Clean Room

Class 100 clean room for photolithography. OAI-200 Mask Aligner; spin coater/hot plates/oven; standard photolithography photoresists/developers available; all lift off and wet etching process will be done in clean room only
Class 100 clean room for photolithography. OAI-200 Mask Aligner; spin coater/hot plates/oven; standard photolithography photoresists/developers available; all lift off and wet etching process will be done in clean room only

Ellipsometer,J. A. Woollam

VASE(Variable angle spectroscopic ellipsometer) is most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals and multi-layers. This tool is used to determine thickness and optical properties of materials. Spectral Range – 193nm to 2700nm; Reflection and Transmission Ellipsometry; Generalized Ellipsometry
VASE(Variable angle spectroscopic ellipsometer) is most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals and multi-layers. This tool is used to determine thickness and optical properties of materials. Spectral Range – 193nm to 2700nm; Reflection and Transmission Ellipsometry; Generalized Ellipsometry

Bruker Innova AFM

The Innova® Atomic Force Microscope (AFM) delivers accurate, high-resolution imaging and a wide range of functionality for advanced research in physical and material sciences. Lowest Noise, Highest Resolution AFM in its Class
The Innova® Atomic Force Microscope (AFM) delivers accurate, high-resolution imaging and a wide range of functionality for advanced research in physical and material sciences. Lowest Noise, Highest Resolution AFM in its Class

Agilent G200 Nanoindenter

The Agilent G200 nanoidenter is utilized to characterize the mechanical properties (modulus, hardness) of thin films. This indenter features the XP head and can peform indentation and scratch tests;
The Agilent G200 nanoidenter is utilized to characterize the mechanical properties (modulus, hardness) of thin films. This indenter features the XP head and can peform indentation and scratch tests; <0.01 nm displacement resolution; 50 nN load resolution – Max load of 500 mN

Renishaw inVia Raman microscope

InVia Raman microscope is an instrument for materials analysis, including a research-grade optical microscope coupled to a high-performance Raman spectrometer. This new generation Raman microscope offers a powerful non-destructive and non-contact method of sample analysis. InVia Raman microscope is fitted with two diffraction gratings(1800 lines/mm and 2400 lines/mm) to satisfy all requirements for spectral resolution, spectral coverage and optimized sensitivity. This system is fitted with a Renishaw HSES automated XYZ stage coupled to a High resolution color video, 5MP CMOS camera, can provide the mapping and imaging capabilities . Rather than just viewing discrete spectra you can create information – rich maps and images that fully illustrate your most complex samples.
InVia Raman microscope is an instrument for materials analysis, including a research-grade optical microscope coupled to a high-performance Raman spectrometer. This new generation Raman microscope offers a powerful non-destructive and non-contact method of sample analysis. InVia Raman microscope is fitted with two diffraction gratings(1800 lines/mm and 2400 lines/mm) to satisfy all requirements for spectral resolution, spectral coverage and optimized sensitivity. This system is fitted with a Renishaw HSES automated XYZ stage coupled to a High resolution color video, 5MP CMOS camera, can provide the mapping and imaging capabilities . Rather than just viewing discrete spectra you can create information – rich maps and images that fully illustrate your most complex samples.

Zeta Potential and Submicron Particle Size Analyzers

This system measures particle size in the range of 0.6 nm to 7 µm and zeta potential of particles in the size range of 0.6 nm to 30 μm using photon correlation spectroscopy and electrophoretic light scattering.The optional autotitrator enables isoelectric point determination by measuring zeta potential over a range of pH values.
This system measures particle size in the range of 0.6 nm to 7 µm and zeta potential of particles in the size range of 0.6 nm to 30 μm using photon correlation spectroscopy and electrophoretic light scattering.The optional autotitrator enables isoelectric point determination by measuring zeta potential over a range of pH values.

Optical Profilometer, Vecco NT 9109

Optical Profiler measure surface topography from nanometer-scale roughness through millimeter-scale steps, with an unmatched combination of sub-nanometer resolution. This interferometry systems provides most precise, 3D surface metrology. Sub-nanometer resolution for roughness analysis of super-smooth surfaces; fast measurement acquisition over large lateral areas.
Optical Profiler measure surface topography from nanometer-scale roughness through millimeter-scale steps, with an unmatched combination of sub-nanometer resolution. This interferometry systems provides most precise, 3D surface metrology. Sub-nanometer resolution for roughness analysis of super-smooth surfaces; fast measurement acquisition over large lateral areas.

Tencor Stylus Profilometer

The Alphastep 200 is a stylus step profiler with a manual X-Y stage, and a 9″ video monitor which displays a magnified view of the sample and stylus during the scan, as well as scan profiles and a summary of scan data. The system allows the operator to set, variety of scan parameters such as scan direction, scan length/sampling rate and vertical units (kA vs. Mm). Resolution is ±5nm.
The Alphastep 200 is a stylus step profiler with a manual X-Y stage, and a 9″ video monitor which displays a magnified view of the sample and stylus during the scan, as well as scan profiles and a summary of scan data. The system allows the operator to set, variety of scan parameters such as scan direction, scan length/sampling rate and vertical units (kA vs. Mm). Resolution is ±5nm.

Contact Angle Goniometer

The ramé-hart Model 200 Standard Contact Angle Goniometer is a powerful tool for measuring contact angle and surface energy. The DROPimage Standard software measures contact angle and includes a suite of surface energy tools including: the Acid-Base Tool, the Surface Energy Tool, the Work of Adhesion Tool and Zisman’s Plot Tool.
The ramé-hart Model 200 Standard Contact Angle Goniometer is a powerful tool for measuring contact angle and surface energy. The DROPimage Standard software measures contact angle and includes a suite of surface energy tools including: the Acid-Base Tool, the Surface Energy Tool, the Work of Adhesion Tool and Zisman’s Plot Tool.

Nicolet 4700 FT-IR

The instrument is a routine-use, mid-IR (~400-4000 wavenumbers). The maximum resolution is 0.5 wavenumbers.Attenuated Total Reflectance(ATR)-FTIR is also available.
The instrument is a routine-use, mid-IR (~400-4000 wavenumbers). The maximum resolution is 0.5 wavenumbers.Attenuated Total Reflectance(ATR)-FTIR is also available.

Shimadzu UV-2401 UV-VIS spectrophotometer

The Shimadzu UV-2401 UV-VIS spectrophotometer is a standard research-grade UV-VIS spectrophotometer capable of scanning from 190-900 nm. The software is capable of acquiring data in spectrum mode, photometric mode and kinetic data. There are two attachments available, the standard 2-cell sample/reference holder and other to hold flat substrates.
The Shimadzu UV-2401 UV-VIS spectrophotometer is a standard research-grade UV-VIS spectrophotometer capable of scanning from 190-900 nm. The software is capable of acquiring data in spectrum mode, photometric mode and kinetic data. There are two attachments available, the standard 2-cell sample/reference holder and other to hold flat substrates.

Surface Area Analyzer

The Autosorb-1-MP/LP Automatic Surface Area and Pore Size Analyzer is a fully automated, vacuum volumetric, gas sorption system for characterization of surface area, pore volume and pore size distribution of microporous and mesoporous solids.This system is very useful for the characterization of nanostructured and porous materials.
The Autosorb-1-MP/LP Automatic Surface Area and Pore Size Analyzer is a fully automated, vacuum volumetric, gas sorption system for characterization of surface area, pore volume and pore size distribution of microporous and mesoporous solids.This system is very useful for the characterization of nanostructured and porous materials.

Thermal Analysis

Simultaneous DSC TGA (SDT 600): This system provides simultaneous measurement of weight change (TGA) and differential heat flow (DSC) on the same sample from ambient to 1,500°C. The system is equipped with Platinum-Rhodium thermocouple based temperature control unit, horizontal furnace and gas purge system.
Simultaneous DSC TGA (SDT 600): This system provides simultaneous measurement of weight change (TGA) and differential heat flow (DSC) on the same sample from ambient to 1,500°C. The system is equipped with Platinum-Rhodium thermocouple based temperature control unit, horizontal furnace and gas purge system.

Rapid Thermal Processing

The Heatpulse 610 is a rapid thermal annealing system capable of heating a sample to temperatures as high as 1000°C in a very short time. Ramp rates of around 50-60°C/sec are reasonable. The Heatpulse system uses a set of high intensity lamps that surround a quartz isolation tube to heat the sample. An isolation tube is used to create an isolated gaseous environment in which to heat your sample. Currently the process gases available for use are Argon and Forming Gas (5% Hydrogen with Nitrogen balance).
The Heatpulse 610 is a rapid thermal annealing system capable of heating a sample to temperatures as high as 1000°C in a very short time. Ramp rates of around 50-60°C/sec are reasonable. The Heatpulse system uses a set of high intensity lamps that surround a quartz isolation tube to heat the sample. An isolation tube is used to create an isolated gaseous environment in which to heat your sample. Currently the process gases available for use are Argon and Forming Gas (5% Hydrogen with Nitrogen balance).

Rapid Thermal Processing

K & S model 4123 wedge bonder is an aluminum and gold wire wedge bonder that can be used for bonding devices. This machine is operated in ultrasonic mode.
K & S model 4123 wedge bonder is an aluminum and gold wire wedge bonder that can be used for bonding devices. This machine is operated in ultrasonic mode.

Hall Measurement System

MMR’s Variable Temperature Hall System (VTHS) allows the user to make automatic measurements of resistivity, mobility and carrier concentration of a wide range of samples using the Van der Pauw method.
MMR’s Variable Temperature Hall System (VTHS) allows the user to make automatic measurements of resistivity, mobility and carrier concentration of a wide range of samples using the Van der Pauw method.

Rigaku X-ray diffractometer

This tool has a multistage goniometer that accommodates powder samples and thin films. Besides, standard diffraction scan, this tool can do the thin film reflectivity measurements to determine the density, roughness, interface roughness of multilayer thin films.
This tool has a multistage goniometer that accommodates powder samples and thin films. Besides, standard diffraction scan, this tool can do the thin film reflectivity measurements to determine the density, roughness, interface roughness of multilayer thin films.

Rigaku X-ray diffractometer

Planetary Ball Mills are used for mixing and size reduction processes. The mills also can perform colloidal grinding and have the energy input necessary for mechanical alloying processes. The extremely high centrifugal forces of a planetary ball mill result in very high pulverization energy and therefore short grinding times.
Planetary Ball Mills are used for mixing and size reduction processes. The mills also can perform colloidal grinding and have the energy input necessary for mechanical alloying processes. The extremely high centrifugal forces of a planetary ball mill result in very high pulverization energy and therefore short grinding times.

Bomb calorimetry

Bomb calorimetry is a fundamental test in calorific measurements. Heats of combustion, as determined in an oxygen bomb calorimeter, are measured by a substitution procedure in which the heat obtained from the sample is compared with the heat obtained from a standardizing material.
Bomb calorimetry is a fundamental test in calorific measurements. Heats of combustion, as determined in an oxygen bomb calorimeter, are measured by a substitution procedure in which the heat obtained from the sample is compared with the heat obtained from a standardizing material.

LabRam acoustic mixer

The LabRAM is a lab mixer that thoroughly mixes gases, liquids, solids, powders and very viscous compounds with a nominal capacity of 1-pint. A variety of mixing vessels may be used including small vials and disposable plastic containers and bags.
The LabRAM is a lab mixer that thoroughly mixes gases, liquids, solids, powders and very viscous compounds with a nominal capacity of 1-pint. A variety of mixing vessels may be used including small vials and disposable plastic containers and bags.

LabRam acoustic mixer

The self-contained AutoPellet press has 5″ diameter platen and integral safety shield cabinet enclosing electrically powered hydraulic system. It maintains precise alignment and includes provision for a vacuum line connection to the pellet die. Pellet dies are available in different sample sizes of ¼, ½, ¾ and 1 inch in diameter.
The self-contained AutoPellet press has 5″ diameter platen and integral safety shield cabinet enclosing electrically powered hydraulic system. It maintains precise alignment and includes provision for a vacuum line connection to the pellet die. Pellet dies are available in different sample sizes of ¼, ½, ¾ and 1 inch in diameter.
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